Coating apparatus – Gas or vapor deposition – With treating means
Patent
1997-05-09
2000-11-14
Mills, Gregory
Coating apparatus
Gas or vapor deposition
With treating means
156345, C23C 1600
Patent
active
061454699
ABSTRACT:
A plasma processing apparatus has a substrate holder, arranged in a reaction vessel which can be reduced in pressure, for placing a substrate to be processed thereon, means for feeding a process gas into the reaction vessel, and a cathode electrode for supplying a high-frequency wave power from a high-frequency wave power source to an interior of the reaction vessel through a matching circuit, and is characterized in that at least a part of the reaction vessel is constituted by a dielectric member, and the cathode electrode is arranged outside the reaction vessel, so that a plasma distribution in the reaction vessel is made uniform, and a uniform plasma process for a substrate to be processed is made possible. The plasma process includes CVD, sputtering, etching or ashing.
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Takaki Satoshi
Teranishi Koji
Yamagami Atsushi
Alejandro Luz
Canon Kabushiki Kaisha
Mills Gregory
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