Method for the preparation of silicon compound thin film

Details Method for the preparation of silicon compound thin film Method for the preparation of silicon compound thin film

1998-06-02

1999-10-19

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

42724915, 42725529, 427255394, 427578, H05H 124

Patent

active

059686120

ABSTRACT:
The invention provides a method for preparing a silicon thin film at a high deposition rate or a silicon compound thin film having a high dielectric strength and high hardness, without causing damage to other structure films or forming flakes during film deposition. The method for preparing a silicon or silicon compound thin film involves evaporating a material by means of a high density plasma gun, and depositing a thin film of silicon or silicon compound on a substrate.

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