Method and apparatus for epitaxial deposition

Details Method and apparatus for epitaxial deposition Method and apparatus for epitaxial deposition

1991-09-26

1992-11-03

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118724, 118730, C23C 1600

Patent

active

051605457

ABSTRACT:
The cooling air flow path extends from a blower through a tapered input duct to a large plenum chamber which coaxially surounds and extends over the top of the deposition apparatus. From this plenum chamber cooling air flows coaxially downward over the surface of the quartz bell jar which forms the reaction chamber, and radially inward through the banks of radiant heater lamps coaxially surrounding the bell jar. Each bank of heater lamps is readily removed for servicing by being rotated into an open position about a pivot axis extending along one vertical edge. From the open position, the bank can be slid sideways in slots in the supports and removed from the apparatus.

REFERENCES:
patent: 4836138 (1989-06-01), Robinson

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