Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Post imaging treatment with particles
Patent
1996-07-03
1997-12-16
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Post imaging treatment with particles
430144, G03F 728
Patent
active
056983743
ABSTRACT:
A process for the preparation of an image is provided, which comprises exposing to light a layer of a composition which changes its stickiness when irradiated with active light, spraying a particulate image-forming material on to the layer, removing the particulate matter which has not been attached to the layer, and then heating the layer to fix the particulate image-forming to the substrate. This process is suitable for the patterning of not only a fluorescent substance for plasma display but also a light-impermeable or sparingly light-permeable material to which photolithography has heretofore been difficultly applied. Furthermore, the thickness of the image-forming material layer can be easily varied by properly selecting the grain diameter of the image-forming material.
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patent: 5286595 (1994-02-01), Hertler et al.
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patent: 5534380 (1996-07-01), Bodager et al.
Kobayashi Kesanao
Yasui Masahide
Fuji Photo Film Co. , Ltd.
Fuji-Hunt Electronics Technology Co., Ltd.
Young Christopher G.
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