Method for producing metal wirings on an insulating substrate

Fishing – trapping – and vermin destroying

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437 49, 437192, 437237, 437244, 437983, H01L 21265

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active

055189369

ABSTRACT:
A method for producing metal wirings on an insulating substrate is disclosed. The method comprises the steps of forming a metal wiring layer of a predetermined shape on a predetermined position of the insulating substrate, the metal wiring layer being made of a metal capable of being oxidized; implanting the metal wiring layer with an impurity element; and forming an insulating layer by oxidizing the surface of the metal wiring layer after implanting the impurity element.

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Ion Implantation in Semiconductors, Susumu Namba (Editor), Plenum Press, New York, NY (1975) pp. 325-333.
Stanley Wolf, "Silicon Processing for the VLSI ERA" vol. 2, Lattice Press, Cal. (1990) pp. 121-131.
Madakson: "Effects of Tin Ion and Nitrogen Ion Implantation on the Oxidation of Titanium," pp. 205-212, Materials Science & Engineering, (1987).

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