Medium and process for image formation

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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Other Related Categories

430346, 430363, 430495, 430541, 430644, 430936, 430945, 3461351, 346165, G03C 1725, G03C 1735

Type

Patent

Status

active

Patent number

050064460

Description

ABSTRACT:
A medium for image formation which comprises a monomolecular film or monomolecular built-up film of a metal chelate compound and a process for image formation which comprises (1) manipulating the adsorption of a gas on a metal chelate compound and the desorption of the gas therefrom or (2) reducing metal ions in molecules of a metal chelate compound.

REFERENCES:
patent: 4046569 (1977-09-01), Gysling et al.
patent: 4062685 (1977-12-01), Takeda et al.
patent: 4106939 (1978-08-01), Chang et al.
patent: 4184874 (1980-01-01), Takeda
patent: 4328303 (1982-05-01), Ronn et al.
patent: 4435490 (1984-03-01), Lelental et al.
patent: 4539061 (1985-09-01), Sagiv
patent: 4707430 (1987-11-01), Ozawa et al.
Chem. Abst. 145914 a, vol. 77, 1972.
Snow & Jarvis, "Molecular Association and Monolayer Formation", JACS vol. 106, pp. 4706-4711 (1984).
Geoffrey et al., J.A.C.S. 97:14, 3933-3936 (1975).
Simon et al., JACS, 102, No. 24, 7247-7251 (1980).
Shin Jikken Kagaku Koza, vol. 12, pp. 179 & 181.

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