Methods enabling stress crack free patterning of chrome on layer

Details Methods enabling stress crack free patterning of chrome on layer Methods enabling stress crack free patterning of chrome on layer

1988-03-10

1991-04-09

Nguyen, Nam X.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419215, 20419223, 156664, C23C 1434

Patent

active

050062123

ABSTRACT:
There is disclosed a method to enable one to deposit a thin layer of chrome to a thicker layer of an organic polymer. The surface of the organic polymer has a thin layer of silicon dioxide deposited thereon and then a thicker layer of chrome is sputtered onto said layer of silicon dioxide. This enables one to pattern and to wire bond to the chrome layer while avoiding stress cracks in the chrome as provided by prior art techniques.

REFERENCES:
patent: 4048039 (1977-09-01), Daxinger
patent: 4097636 (1978-07-01), Hawryls et al.
patent: 4364792 (1982-12-01), Gliem et al.
patent: 4383003 (1983-05-01), Lifshin et al.
patent: 4655897 (1987-04-01), DiSanto et al.
patent: 4705592 (1987-11-01), Bahrle et al.
patent: 4728406 (1988-03-01), Banerjee et al.

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