Process for producing high purity tantalum oxide

Details Process for producing high purity tantalum oxide Process for producing high purity tantalum oxide

1984-02-29

1985-08-27

Carter, H. T.

Chemistry of inorganic compounds

Treating mixture to obtain metal containing compound

Group vb metal

423 62, 423 68, C01G 3500

Patent

active

045377502

ABSTRACT:
A process is disclosed for producing high purity tantalum oxide from impure tantalum oxide. The starting tantalum oxide is dissolved in a hydrofluoric acid solution and insolubles are removed. The hydrofluoric acid solution containing the tantalum values is adjusted to a pH of from about 6.0 to about 8.0 with a base to precipitate tantalum which is separated from the mother liquor. The tantalum precipitate is then dissolved in an oxalic acid solution, the pH adjusted to from about 5.1 to about 5.5, and the resulting solution digested to precipitate a high purity tantalum compound which is separated. The high purity tantalum compound is then digested in hydrochloric acid to dissolve the compound and then precipitate pure optical grade tantalum oxide which is then separated from its mother liquor.

REFERENCES:
patent: 1802242 (1931-04-01), Fink et al.
patent: 3099526 (1963-07-01), Li et al.
patent: 4302243 (1981-11-01), Tamaru et al.

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