Resist composition with radiation sensitive acid generator

Details Resist composition with radiation sensitive acid generator Resist composition with radiation sensitive acid generator

1995-12-01

1996-12-17

McPherson, John A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430910, 430914, 522 68, G03F 7004

Patent

active

055852203

ABSTRACT:
The invention relates to a polymeric, radiation-sensitive resist composition comprising (i) iodonium sulfonate radiation sensitive acid generator; (ii) a polymer; and (iii) an acid labile compound.

REFERENCES:
patent: 4450360 (1984-05-01), Crivello et al.
patent: 4513137 (1985-04-01), Koser et al.
patent: 4780511 (1988-10-01), Crivello et al.
patent: 5286901 (1994-02-01), Stang et al.
patent: 5374500 (1994-12-01), Carpenter, Jr. et al.
patent: 5492793 (1996-02-01), Breyta et al.

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