Method of etching conductive lines without undercutting

Details Method of etching conductive lines without undercutting Method of etching conductive lines without undercutting

1995-01-03

1997-12-30

Breneman, R. Bruce

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

1566561, 216 67, 216 77, H01L 21302

Patent

active

057025649

ABSTRACT:
Undercutting of conductive lines in a dense array bordered by an open field is avoided by reducing the severity of etching when the conductive material in the open field is substantially removed. In a preferred embodiment, the flow rate of chlorine gas is reduced during high density chlorine plasma etching of a conductive pattern when the conductive material is substantially removed from the open field.

REFERENCES:
patent: 5167762 (1992-12-01), Carr et al.
patent: 5207868 (1993-05-01), Shinohara
patent: 5211804 (1993-05-01), Kobayashi
patent: 5350488 (1994-09-01), Webb
patent: 5387556 (1995-02-01), Xiaobing et al.
patent: 5411631 (1995-05-01), Hori et al.
Suzuki et al., "Residue formation an elimination in chlorine-based plasma etching of Al-Si-Cu interconnections," Journal of Vacuum Science and Technology, Part B, vol. 10, No. 2, pp. 596-600, Mar. 1992.
Suzuki et al., "Residue formation and elimination in chlorine-based plasma etching of Al-Si-Cu Interconnections," Journal of Bacuum Science and Technology, Part B, vol. 10, No. 2, Apr. 1992, pp. 596-600.
Marx et al., "Electron cycloton resonance etching of aluminun alloys with BCl.sub.3 -Cl.sub.2 -N.sub.2," Journal of Vacuum Science and Technology, Part A, vol. 10, No. 4, Aug. 1992, pp. 1232-1237.

Affiliated with

Also associated with

Rating

Method of etching conductive lines without undercutting does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of etching conductive lines without undercutting, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of etching conductive lines without undercutting will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-198840