Photosensitive resin composition

Details Photosensitive resin composition Photosensitive resin composition

1991-05-15

1993-05-04

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430945, 522 67, 522 2, G03H 7038

Patent

active

052081338

ABSTRACT:
A photosensitive resin composition, which is a mixture of a base resin, an acid cross-linking agent and a photoreactive acid catalyst generator, is disclosed. The photoreactive acid catalyst generator contains tetrakis-1,2,4,5-(polyhalomethyl)benzene or tris(polyhalomethyl)benzene. The composition is a so-called three-component chemically amplified photoresist. When irradiated with an excimer laser light, the photoreactive acid generator is decomposed to yield a Lewis acid catalyst, while also yielding radicals, the photoreactive acid generator acting itself as an acid-linking auxiliary to improve the sensitivity of the photosensitive resin composition significantly. It becomes possible in this manner to form a fine resist pattern with superior resolution in the excimer laser lithography. On the other hand, the sensitivity dependency of the base resin or light transmittance may be lowered to increase the degree of freedom in material selection and designing.

REFERENCES:
patent: 3515552 (1970-06-01), Smith
patent: 4113497 (1978-09-01), Schlesinger

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