Cleaning process for removal of deposits from the susceptor of a

Details Cleaning process for removal of deposits from the susceptor of a Cleaning process for removal of deposits from the susceptor of a

1992-06-03

1993-05-04

Morris, Theodore

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 26, 134 30, 134 31, 156643, B08B 300

Patent

active

052078361

ABSTRACT:
An improved process is disclosed for the removal of deposits such as tungsten or tungsten silicide from a susceptor in a vacuum deposition chamber without leaving fluorine residues by first flowing a gaseous source of fluorine into a vacuum deposition chamber and igniting a plasma in the chamber while the gaseous source of fluorine is flowing therein to remove the depositions followed by flowing a gaseous source of hydrogen into the chamber and maintaining a plasma in the chamber during the flow of the gaseous source of hydrogen to remove any fluorine residues from the chamber.

REFERENCES:
patent: 4134817 (1978-01-01), Bourdon
patent: 4713141 (1987-12-01), Tsang
patent: 4838990 (1989-06-01), Jucha et al.
patent: 4915777 (1990-04-01), Jucha et al.
patent: 4923828 (1990-05-01), Gluck et al.
Translation of Japanese Patent 62-291664.

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