Electron-optical system with variable-shaped beam for generating

Details Electron-optical system with variable-shaped beam for generating Electron-optical system with variable-shaped beam for generating

1984-08-22

1985-04-30

Smith, Alfred E.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 37145, H01J 3730

Patent

active

045146381

ABSTRACT:
An electron-optical system with a variable-shaped beam for generating and measuring microstructures, such as circuits on a semiconductor substrate, generates the variable-shaped electron beam by the use of electron-optical shadow projection imaging and has a remote focus multipole Wehnelt electrode for adjusting, focusing, and controlling the intensity of the electron beam. The system also has a ferrite polecylinder in the beam projections lens with field attenuation or may have a beam projection lens with an external air gap. The length of the electron beam is approximately 60 centimeters.

REFERENCES:
patent: 3777211 (1973-12-01), Kuijpers
patent: 4117340 (1978-09-01), Goto et al.
patent: 4145597 (1979-03-01), Yasuda
patent: 4258265 (1981-03-01), Sumi
patent: 4263514 (1981-04-01), Reeds
patent: 4393308 (1983-07-01), Anger et al.

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