Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-03-06
2000-10-24
Weiner, Laura
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
522162, G03C 173
Patent
active
061364991
ABSTRACT:
The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
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Goodall Brian L.
Jayaraman Saikumar
Rhodes Larry F.
Shick Robert A.
Dunlap Thoburn T.
The B. F. Goodrich Company
Weiner Laura
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