Microwave RF, or AC/DC discharge assisted flame deposition of CV

Details Microwave RF, or AC/DC discharge assisted flame deposition of CV Microwave RF, or AC/DC discharge assisted flame deposition of CV

Filed on

1993-06-09

Date issued

1995-11-07

Examiner

Padgett, Marianne

Patent Class

Coating processes

SubClass

Direct application of electrical, magnetic, wave, or...

SubSubClass

Plasma

Other Related Categories

427450, 427575, 427577, 427122, 427249, 423446, B05D 306, B01J 306

Type

Patent

Status

active

Patent number

054646650

Description

ABSTRACT:
Broadly, the present invention is directed to improving a chemical vapor phase deposition (CVD) method for synthesis of diamond wherein a hydrocarbon/hydrogen gaseous mixture is subjected to a combustion flame in the presence of oxygen to at least partially decompose the gaseous mixture to form CVD diamond. The improvement in process comprises subjecting said combustion flame to one or more of dielectric heating, d.c. discharge, or a.c. discharge. Dielectric heating can be accomplished by subjecting the combustion flame to microwave (MW) frequency discharge or radiofrequency (RF) discharge. By superimposing dielectric heating or d.c./a.c. discharge plasma generation on combustion flame process, the carbon utilization rate of the combustion flame process should improve substantially. As noted above, given the low carbon utilization rate for combustion flame techniques already, small percentage improvements in the carbon utilization rates translate into substantial cost savings in generation of CVD diamond by such combustion flame technique.

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Webster's Ninth New Collegiate Dictionary, p. 971 Merriam-Webster, Inc., Springfield, Mass., U.S.A. 1990 (no month).

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