Method of polishing/flattening diamond

Details Method of polishing/flattening diamond Method of polishing/flattening diamond

1994-03-08

1996-03-19

Breneman, R. Bruce

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

1566321, 1566301, 1566431, B44C 122

Patent

active

055000770

ABSTRACT:
A method of flattening diamond, including: forming a flat coating comprising a material different from diamond, on a surface of diamond having unevenness; and removing the coating and the unevenness of the surface of diamond by dry etching under a condition such that both of the coating and the diamond can be etched, thereby to smooth the surface of the diamond.

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patent: 5186973 (1993-02-01), Garg
patent: 5204210 (1993-04-01), Jansen
Silicon Processing for the VLSI ERA, vol. 1-Process Technology, S. Wolf and R. N. Tauber, Lattice Press, 1986, pp. 430-431.
Patent Abstracts of Japan, vol. 13, No. 260 (c-207) (3608) Jun. 1989 & JP-A-01 062 484 (Seiko Instr. & Electronics Ltd.) Mar. 1989.
Patent Abstracts of Japan, vol. 18, No. 8 (E-1486) Jan. 1994 & JP-A-05 251 586 (Seiko Epson Corp.) Sep. 1993.
Patent Abstracts of Japan, vol. 17, No. 625 (E-1461) Nov. 1993, & JP-A-05 198 504 (Seiko Epson Corp.) Aug. 1993.
Applied Physics Letters, vol. 61, No. 19, Nov. 1992, New York US, pp. 2326-2328, Grot "Oxygen based electron cyclotron resonance etching of semiconducting homoepitaxial diamond films", p. 2326.
Diamond and Related Materials, vol. 1, No. 9, Sep. 1992, Amsterdam NL, pp. 949-953, Jin et al. "Polishing of cvd diamond by diffusional reaction with manganese powder", pp. 952-953.

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