Method of making a tooth shaped capacitor

Details Method of making a tooth shaped capacitor Method of making a tooth shaped capacitor

1997-01-30

1997-09-23

Niebling, John

Fishing, trapping, and vermin destroying

437919, 437917, 148DIG138, H01L 2170

Patent

active

056704062

ABSTRACT:
A method of manufacturing a capacitor for use in semiconductor memories is disclosed herein. The present invention includes forming anti-oxidizing regions from dot silicon for use as an oxidation mask to oxidize a polysilicon layer. Further, a silicon oxide layer is used as an etching mask to form a bottom storage node of a capacitor. An etching process is performed to etch a portion of the first polysilicon layer. Next, the silicon oxide layer is removed to define the bottom storage node. Utilizing the bottom storage node structure, the present invention can be used to increase the surface area of the capacitor.

REFERENCES:
patent: 5134086 (1992-07-01), Ahn
patent: 5427974 (1995-06-01), Lue et al.
patent: 5464791 (1995-11-01), Hirota
patent: 5567637 (1996-10-01), Hirota

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