Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1986-06-10
1990-01-30
Doll, John
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156612, 156613, 156614, 156DIG64, 156DIG99, 428698, C30B 2520
Patent
active
048971499
ABSTRACT:
A single-crystal substrate of silicon carbide comprising a single-crystal substrate member of a material other than .alpha.-SiC, and a single-crystal layer of .alpha.-SiC formed over the substrate member with a ground layer provided between the substrate member and the single-crystal layer, the ground layer comprising a single-crystal layer of nitride of AlN, GaN or Al.sub.x Ga.sub.1-x N (0<x<1) having a hexagonal crystal structure or a crystal layer of the same structure made of a mixture of SiC and at least one of the nitrides; and a method for fabricating the same.
REFERENCES:
patent: 3634149 (1972-01-01), Knippenberg et al.
patent: 3960619 (1976-06-01), Seiter
patent: 4028149 (1977-06-01), Deines et al.
patent: 4147572 (1979-04-01), Vodakov et al.
patent: 4161743 (1979-07-01), Yanezawa et al.
patent: 4382837 (1983-05-01), Rutz
"Growth of Silicon Carbide from Solution", the Marshall article from the Material Research Bulletin, vol. 4, pp. S73-S84 (1969).
"Growth Phenomena in Silicon Carbide", the Knippenberg article, Chapter 8, entitled "The Growth of Silicon Carbide by Recrystallization and Sublimation", pp. 244-266, vol. 18, No. 3.
Chapter of the Knippenberg article entitled "Preparative Procedures" at pp. 171-179.
Furukawa Katsuki
Shigeta Mitsuhiro
Suzuki Akira
Doll John
Kunemund Robert M.
Sharp Kabushiki Kaisha
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