Method and device for the rapid deflection of a particle beam

Details Method and device for the rapid deflection of a particle beam Method and device for the rapid deflection of a particle beam

1980-07-24

1982-06-15

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

250398, H01J 3700, H01J 36147

Patent

active

043353096

ABSTRACT:
In an exemplary system, a two stage deflection system responds to a first control signal of low frequency such that extra-axial chromatic errors due to electrostatic and magnetic deflection are made equal and opposite. The magnetic and electrostatic deflection systems may be arranged in either order along the beam path just so the low frequency electrostatic deflection is one-half the magnetic deflection and is in an opposite direction at the target. A second higher frequency control signal controls only the electrostatic deflection system. Preferably the deflection velocities at the target produced by the two control signals are equal, with the higher frequency being an integral multiple of the lower frequency and with the control signals being poled to provide opposite deflections. When the two deflection velocities are superimposed, the resultant is then a step type deflection as a function of time.

REFERENCES:
patent: 3749964 (1973-07-01), Hirata
patent: 3894271 (1975-07-01), Pfeiffer et al.
patent: 4117339 (1978-09-01), Wolfe
patent: 4149085 (1979-04-01), Davis et al.
patent: 4213053 (1980-07-01), Pfeiffer
J. L. Maner et al., "Electronoptics of the Electron-beam Lithography System, EL1 " Tech. Digest, 1976, International Electron Devices Meeting, Washington, D.C., pp. 434-436.
J. L. Loughram et al., "Correction of Field Distortion in the Electron-beam Lithography System, EL1, " Tech. Dig., 1976, International Electron Devices Meeting, Washington, D.C., pp. 437-439.
D. E. Davis et al., "Automatic Registration in an Electron-beam Exposure System", Tech. Dig., 1976, Int. Electron Devices Meeting, Wash., D.C., pp. 440-442.

Affiliated with

Also associated with

Rating

Method and device for the rapid deflection of a particle beam does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and device for the rapid deflection of a particle beam, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and device for the rapid deflection of a particle beam will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1920479