Method for restoring an electrostatic chuck force

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field

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Details

361212, 279128, H02N 1300

Patent

active

060697857

ABSTRACT:
A method for restoring an electrostatic chuck force of an electrostatic chuck in a plasma apparatus includes the steps of only supplying a source gas, and applying a source power, but not an RF bias, to the plasma apparatus to induce a positive plasma. The positive plasma discharges any accumulated negative charge on the electrostatic chuck.

REFERENCES:
patent: 5378311 (1995-01-01), Nagayama et al.
patent: 5507874 (1996-04-01), Su et al.
patent: 5573981 (1996-11-01), Sato
patent: 5585012 (1996-12-01), Wu et al.
patent: 5681424 (1997-10-01), Saito et al.
patent: 5746928 (1998-05-01), Yen et al.

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