Positive-working photosensitive benzoin esters

Details Positive-working photosensitive benzoin esters Positive-working photosensitive benzoin esters

1983-03-28

1984-09-04

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430271, 430296, 430326, 430905, 526328, 526329, 5263293, 5263296, 20415922, G03C 178

Patent

active

044697740

ABSTRACT:
Photosensitive polymeric esters of alkoxybenzoin as defined which upon exposure become soluble in alkaline developers. The positive-working polymeric compounds are used as contact litho films, lithographic and relief printing plates and photoresists.

REFERENCES:
patent: 3849137 (1974-11-01), Barzynski et al.
Sheehan et al. The Photolysis of Methoxy-Substituted Benzoin Esters. A Photosensitive Protecting Group For Carboxylic Acids, J. Am. Chem. Soc. 93, 7222, 1971.

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