Semiconductor substrate heater and reactor process and apparatus

Details Semiconductor substrate heater and reactor process and apparatus Semiconductor substrate heater and reactor process and apparatus

1988-10-14

1990-07-03

Pal, Asok

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156613, 118725, 118728, 118500, 219385, 219399, 219430, 219439, 219462, 219521, 219530, 219540, C30B 2302, C30B 2510

Patent

active

049388150

ABSTRACT:
A semiconductor substrate heater process and apparatus are disclosed for uniformly heating semiconductor substrates. A device for supporting the back side of an IC wafer in a reaction chamber and for conduction heating therein and auxiliary heat directed to the front side of the substrate by reflection from the inside surface of the reaction chamber and/or by an auxiliary heating source within the reaction chamber are disclosed.

REFERENCES:
patent: 2897331 (1959-07-01), McFarlane et al.
patent: 3083286 (1963-03-01), Swetlitz
patent: 3391270 (1968-07-01), Harris et al.
patent: 3505499 (1970-04-01), Walther
patent: 3536893 (1970-10-01), Cranley
patent: 3623712 (1971-11-01), McNeilly
patent: 3673785 (1972-06-01), Drugmand et al.
patent: 3815575 (1974-06-01), Danis
patent: 3983359 (1976-09-01), Walker et al.
patent: 4047496 (1977-09-01), McNeilly et al.
patent: 4081313 (1978-03-01), McNeilly et al.
patent: 4456186 (1984-06-01), Ando
patent: 4496609 (1985-01-01), McNeilly et al.
patent: 4579609 (1986-04-01), Reif et al.
patent: 4778559 (1988-10-01), McNeilly
Soviet Inventions Illustrated, Section E1: Electrical Week 8627, Aug. 13, 1985, p. 20.
Soviet Inventions Illustrated, Section Ch: Chemical, Week E06, Mar. 24, 1982, p. 16.

Affiliated with

Also associated with

Rating

Semiconductor substrate heater and reactor process and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor substrate heater and reactor process and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor substrate heater and reactor process and apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1888584