Coating apparatus – Gas or vapor deposition – With treating means
Patent
1996-08-15
1998-06-30
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
118723MR, 156345, 20429816, 20429837, C23C 1600
Patent
active
057727724
ABSTRACT:
A plasma diffusion control apparatus is provided with a plurality of wires through which current flows in parallel so that lines of magnetic force are generated in a direction parallel to the plasma wall of the diffusion chamber wall. It is preferable that the wires are located in the neighborhood of the diffusion chamber at equal intervals, and arranged so that the direction of the magnetic field generated by wires are parallel to the direction of movement of the plasma. Since the magnetic field is formed in a direction parallel to the inner wall of the diffusion chamber, it is possible to prevent the diffusion of the plasma to the chamber wall. As a result there is no region which is influenced by strong local magnetic fields perpendicular to the plasma chamber wall, so that it is possible to solve the problems caused by substantial amounts of polymer deposition on the inner wall of the plasma diffusion chamber.
REFERENCES:
patent: 3643123 (1972-02-01), Haeff
patent: 4740268 (1988-04-01), Bukhman
patent: 5032205 (1991-07-01), Hershrowitz
Alejandro Luz
Breneman R. Bruce
Samsung Electronics Co,. Ltd.
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