Process for fabricating semiconductor integrated circuit device,

Details Process for fabricating semiconductor integrated circuit device, Process for fabricating semiconductor integrated circuit device,

1995-06-07

1998-05-19

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430396, 2504921, G03F 700

Patent

active

057534160

ABSTRACT:
Herein disclosed is an exposure technology for a semiconductor integrated circuit device which has a pattern as fine as that of an exposure wavelength. The technology contemplates to improve the resolution characteristics of the pattern by making use of the mutual interference of exposure luminous fluxes.

REFERENCES:
patent: 4153457 (1979-05-01), Kellie
patent: 5266446 (1993-11-01), Chang et al.

Affiliated with

Also associated with

Rating

Process for fabricating semiconductor integrated circuit device, does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for fabricating semiconductor integrated circuit device,, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for fabricating semiconductor integrated circuit device, will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1851589