Electron beam exposure system having an electromagnetic deflecto

Details Electron beam exposure system having an electromagnetic deflecto Electron beam exposure system having an electromagnetic deflecto

1992-04-27

1993-11-23

Dzierzynski, Paul M.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250396ML, 335210, H01J 332

Patent

active

052647064

ABSTRACT:
An electron beam exposure system comprises a beam source for producing and directing an electron beam along an optical axis, an evacuated column for accommodating the beam source and extending along the optical axis, an electron lens for focusing the electron beam on a substrate; and an electromagnetic deflector supplied with a control signal for deflecting the electron beam in response to the control signal. The electromagnetic deflector comprises an inner sleeve surrounding the evacuated column, first and second mutually separate windings provided on an outer surface of the inner sleeve in opposed relationship with respect to each other across the optical axis, an outer sleeve surrounding the inner sleeve with a separation therebetween defining a passageway for the flow of a coolant therethrough; third and fourth, mutually separate windings provided on an inner surface of the outer sleeve in opposed relationship with respect to each other across the optical axis, an inlet for introducing the coolant into the passageway, and an outlet for exiting the coolant from the passageway.

REFERENCES:
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patent: 4758810 (1988-07-01), Tamura
patent: 4902898 (1990-02-01), Jones et al.
patent: 5051600 (1991-09-01), Schuetz et al.
patent: 5118949 (1992-06-01), Rappat et al.
patent: 5136166 (1992-08-01), Young

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