Process for forming deposited film

Details Process for forming deposited film Process for forming deposited film

1995-06-06

1998-05-19

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

118719, 118722, 118723MP, 118723MW, 118723ME, 118723MR, 118723MA, 118723AN, 118723E, 118723ER, 118723I, 118723IR, 156345, 156626, 156627, 4272552, 4272553, 427294, 427576, 427582, 427583, 427584, 427586, H05H 100

Patent

active

057533202

ABSTRACT:
A process for forming a deposited film on a substrate according to the chemical vapor deposition method comprises previously forming excited species of a gas phase compound containing atoms which become constituents constituting said deposited film, supplying the excited species onto the surface of said substrate and effecting photoirradiation on said substrate surface, thereby forming the deposited film through the surface reaction.

REFERENCES:
patent: 4505949 (1985-03-01), Jelks

Affiliated with

Also associated with

Rating

Process for forming deposited film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for forming deposited film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for forming deposited film will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1850957