Method for forming a semiconductor connection with a top surface

Details Method for forming a semiconductor connection with a top surface Method for forming a semiconductor connection with a top surface

1997-12-04

2000-05-23

Niebling, John F.

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

438618, 438629, 438631, 438640, 438666, 438668, 438673, H01L 2144

Patent

active

060665599

ABSTRACT:
A method of forming a connection is comprised of the steps of depositing a lower conductor. A dielectric layer is deposited on the lower conductor, with the dielectric layer having a lower surface adjacent to the lower conductor, and having an upper surface. An opening extending between the upper surface and the lower surface of the dielectric layer is formed. A conductive plug is deposited within the opening, with the plug having an upper surface proximate the upper surface of the dielectric layer. The upper surface has an edge where the upper surface of the plug is adjacent to the dielectric layer. A recess is formed proximate to the edge of the upper surface of the plug, the recess extending into both the plug and the dielectric layer. Finally, an upper conductor is deposited on the upper surface of the dielectric layer and the upper surface of the plug. A connection thus formed is also disclosed.

REFERENCES:
patent: 4489481 (1984-12-01), Jones
patent: 4507853 (1985-04-01), McDavid
patent: 5091768 (1992-02-01), Yamazaki
patent: 5202579 (1993-04-01), Fujii et al.
patent: 5203957 (1993-04-01), Yoo et al.
patent: 5244534 (1993-09-01), Yu et al.
patent: 5254498 (1993-10-01), Sumi
patent: 5269880 (1993-12-01), Jolly et al.
patent: 5279990 (1994-01-01), Sun et al.
patent: 5332691 (1994-07-01), Kinoshita et al.
patent: 5364817 (1994-11-01), Lur et al.
patent: 5381040 (1995-01-01), Sun et al.
patent: 5397742 (1994-03-01), Kim
patent: 5427980 (1995-06-01), Kim
patent: 5453403 (1995-09-01), Meng et al.
patent: 5550405 (1996-08-01), Cheung et al.
patent: 5567650 (1996-10-01), Straight et al.
patent: 5658829 (1997-08-01), Mathews et al.

Affiliated with

Also associated with

Rating

Method for forming a semiconductor connection with a top surface does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming a semiconductor connection with a top surface, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming a semiconductor connection with a top surface will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1836701