Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1989-06-13
1992-02-18
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430910, 522 95, 522 96, 522 92, 522 97, G03F 7028, G03F 7033
Patent
active
050893769
ABSTRACT:
A UV sensitive coating composition is described which uses a polymer prepared from a condensation reaction of a diisocyanate, a hydroxy alkyl (di or tri) (meth)acrylate and a carboxylic acid polyol. Optionally, a polyol and/or a dicarboxylic acid polyol can also be included as reactants. The coating polymer, thus prepared, is combined with binders and crosslinkers to form a solder mask.
REFERENCES:
patent: 3775377 (1973-11-01), Kokawa
patent: 3954587 (1976-05-01), Kokawa
patent: 4153778 (1979-05-01), Park et al.
patent: 4233395 (1980-11-01), Klufel et al.
patent: 4304923 (1981-12-01), Rousseau
patent: 4387139 (1983-06-01), Herwig et al.
patent: 4438190 (1984-03-01), Ishimaru et al.
patent: 4476215 (1984-10-01), Kausch
patent: 4499163 (1985-02-01), Ishimaru et al.
patent: 4717740 (1988-01-01), Hung et al.
Armstrong World Industries Inc.
Hamilton Cynthia
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