Radiation-sensitive polyimide precursor composition derived from

Details Radiation-sensitive polyimide precursor composition derived from Radiation-sensitive polyimide precursor composition derived from

1982-09-29

1983-11-22

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430283, 430288, 430916, 430919, 20415916, 20415918, 20415919, G03C 168

Patent

active

044169736

ABSTRACT:
A radiation-sensitive polyimide precursor composition comprises a polymer of the formula ##STR1## wherein n is a positive integer corresponding to the number of units in the polymer and is sufficiently large to provide the polymer with a number average molecular weight of about 1500-15,000 as determined by vapor pressure osmometry, and wherein for any particular unit in the polymer:.fwdarw.denotes isomerism; R.sup.1 is a divalent aromatic, aliphatic or cycloaliphatic radical containing at least 2 carbon atoms; R.sup.2 and R.sup.3 are selected from the group consisting of a hydrogen radical and any organic radical containing a photopolymerizable olefinic double bond; and R.sup.4 and R.sup.5 are selected from the group consisting of perfluoro and perhalofluoro aliphatic hydrocarbons having 1 to 8 carbons.

REFERENCES:
patent: 3479185 (1969-11-01), Chambers
patent: 3957512 (1976-05-01), Kleeberg et al.
patent: 4271259 (1981-06-01), Breslow et al.
patent: 4310641 (1982-01-01), Ohmura et al.
patent: 4311785 (1982-01-01), Ahne et al.

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