Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1984-02-13
1985-05-07
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
20415918, 430926, 430919, 430923, 430920, G03C 171, G03C 172
Patent
active
045158860
ABSTRACT:
Photosensitive compositions useful as resists for transistors, ICs, etc. comprising a solution of a photosensitive high polymer of a polymer or a copolymer which contains a unit expressed by the following general formula: ##STR1## (where X.sub.1 is an atom of hydrogen or halogen, a halogenated alkyl group of 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms, X.sub.2 is a halogen atom or a halogenated alkyl group having 1 to 4 carbon atoms and R is an aromatic ring or a heterocyclic ring), and a photosensitizing agent dissolved in organic solvents. The photosensitive compositions show marked improvement in photosensitivity and gamma value.
REFERENCES:
patent: 3479185 (1969-11-01), Chambers, Jr. et al.
patent: 3640718 (1972-02-01), Smith
patent: 4258111 (1981-04-01), Matsumoto et al.
patent: 4262081 (1981-04-01), Bowden et al.
patent: 4286049 (1981-08-01), Imamura et al.
patent: 4299911 (1981-06-01), Ochi et al.
patent: 4348472 (1982-09-01), Jagt
patent: 4474869 (1984-10-01), Brault et al.
Julius Grant (ed), Hackh's Chemical Dictionary, (4th Ed.), "Aryl", McGraw-Hill Book Company, New York, N.Y. 1969, p. 62.
Ken Sukegawa and Shungo Sugawara, Japanese Journal of Applied Physics, vol. 20, No. 8, Aug. 1981, pp. L583-L586.
Y. Ohnishi, Journal of Vaccuum Science and Technology, vol. 19, No. 4, Nov./Dec. 1981, pp. 1136-1140.
Fukuda Mitsutoshi
Yamaoka Tsuguo
Hamilton Cynthia
Kittle John E.
Toyo Soda Manufacturing Co. Ltd.
LandOfFree
Photosensitive compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photosensitive compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive compositions will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1800374