Method and apparatus for manufacturing tape-shaped silicon cryst

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156608, 156617H, 156DIG88, 156DIG97, 427 86, C30B 1506

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046647457

ABSTRACT:
A method for horizontal silicon tape drawing is provided which can be practiced at a high drawing speed. The carrier member uses parallel threads of a material having a higher emission factor .epsilon. than the emission factor of molten silicon and such threads serve as crystallization nucleators for silicon. A silicon melt tank is used which has a length l that is at least as long as the contacting length existing between the surface of molten silicon and the horizontally moving threads so that L=V.sub.z .multidot.t where v.sub.z is the drawing speed and t is the dwell time. The drawing direction d.sub.z is set inclined at an angle .alpha..ltoreq. 10.degree. relative to the horizontal. Radiant losses from the silicon melt surface are regulated by reflectors. The method provides the possibility of manufacturing tape-shaped silicon crystals 16 for solar cells with a constant thickness and width.

REFERENCES:
patent: 4305776 (1981-12-01), Grabmaier
patent: 4319953 (1982-03-01), Grabmaier
patent: 4329195 (1982-05-01), Kudo
patent: 4554203 (1985-11-01), Grabmaier et al.
patent: 4563976 (1986-01-01), Foell et al.
patent: 4563979 (1986-01-01), Falckenberg
Bates and Jewett article entitled: "Low Angle Silicon Sheet Growth: A Review of Progress, Problems and Promise," appearing in Proceedings of the Flat-Plate Solar Array Project Research Forum on the High-Speed Growth and Characterization of Crystals for Solar Cells dated Apr. 15, 1984, identfied as JPL Publication 84-23.

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