Shallow groove capacitor fabrication method

Details Shallow groove capacitor fabrication method Shallow groove capacitor fabrication method

1985-04-19

1987-03-17

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

29576W, 29580, 156648, 156657, 1566611, 156662, 357 51, 357 59, 357 65, H01L 21306, B44C 122, C03C 1500, C23F 102

Patent

active

046505440

ABSTRACT:
A shallow capacitor cell is formed by using conventional integrated circuit processes to build a substrate mask having sublithographic dimensions. Multiple grooves, or trenches, are etched into the substrate using this mask. The capacitor dielectric layer and plate are then formed in the grooves.

REFERENCES:
patent: 4017885 (1977-04-01), Kendall et al.
patent: 4449287 (1984-05-01), Maas et al.
patent: 4476623 (1984-10-01), El-Kareh
patent: 4478655 (1984-10-01), Nagakubo et al.
Sunami et al., "A Corrugated Capacitor Cell (CCC)," IEEE Transactions on Electron Devices, vol. ED-31, No. 6, Jun. 1984.

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