Photolithography exposure tool and method for in situ photoresis

Details Photolithography exposure tool and method for in situ photoresis Photolithography exposure tool and method for in situ photoresis

1993-07-29

1994-11-08

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, G03B 2774, G03B 2780, G03B 2742

Patent

active

053631714

ABSTRACT:
An apparatus and method is provided for measuring photoresist parameters in situ is disclosed. Transmission and reflectivity detectors are used in a lithographic exposure tool to obtain in situ absorption parameters and reflectivity data. The absorption parameters and reflectivity data are used in a feedback control system that controls the exposure dose used in the lithographic tool.

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patent: 5198857 (1993-03-01), Goto
Prolith/2, version 2.2 for the PC, Finle Technologies.
Hickman et al., "Use of diffracted light from latent images to improve lithography control," SPIE, 1464: 245-257, 1991.
Bishop et al., "Use of Scatterometry for Resist Processing Control," SPIE, 1673: 441-452, 1992.
Milner et al., "Latent image exposure monitor using scatterometry," SPIE, 1673: 274-283, 1992.
Dill et al., "Characterization of Positive Photoresist," IEEE Transactions on Electron Devices, ED-22(7): 445-452, 1975.

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