Photosensitive compositions of matter comprising epoxide compoun

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430270, 430924, 430927, 522 48, 522904, G03C 172

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active

046578420

ABSTRACT:
Photosensitive compositions of matter which are capable of undergoing condensation or addition reactions and may or may not be crosslinkable, and which contain an anthraquinone of the formula I ##STR1## in which X, X', R' and R" are as defined in patent claim 1 and X or X' is, for example, --OH or --NH.sub.2, at least one monomeric, oligomeric or polymeric compound which can be reacted with this anthraquinone, for example, if X is --OH, a polymer with terminal glycidyl groups, and, where relevant, a crosslinking agent and/or a salt of a metal of group Ib or VIII of the periodic table, are suitable for image formation by means of electroless metal deposition.

REFERENCES:
patent: 3373140 (1968-03-01), Aftergut
patent: 3822235 (1974-07-01), Hunter
patent: 3959547 (1976-05-01), Polichette
patent: 4084023 (1978-04-01), Dafter
patent: 4097283 (1978-06-01), Asano
patent: 4105518 (1978-08-01), McGinniss
patent: 4108803 (1978-08-01), Green
patent: 4177122 (1979-12-01), Sato
patent: 4262085 (1981-04-01), Ehrich
patent: 4413052 (1984-11-01), Green

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