Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Patent
1998-04-10
2000-06-27
Picardat, Kevin M.
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
438667, 438106, H01L 2144
Patent
active
060806680
ABSTRACT:
A method for manufacturing electronic circuit assemblies. A layer of dielectric material is attached to a layer of electrically conductive material. Vias are formed in the layer of dielectric material and filled with conductive paste material. The resulting assembly is attached to a substrate. Because the vias are formed and filled before the dielectric layer is attached to the substrate, it is not necessary to scrap the entire multi-layer structure, which includes the substrate and all the attached layers, when a problem occurs during via formation or filling. This increases the overall yield for the entire circuit assembly manufacturing process.
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New Avenue for Microvias, Electronic Engineering Times, Mar. 18, 1996, p. 68.
Lauffer John M.
Russell David J.
International Business Machines - Corporation
Picardat Kevin M.
Pivnichny John R.
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