Resins for use in chemically amplified resists and manufacturing

Details Resins for use in chemically amplified resists and manufacturing Resins for use in chemically amplified resists and manufacturing

1997-04-16

1998-12-08

Smith, Jeffrey T.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C08F 2010

Patent

active

058470638

ABSTRACT:
Resins for use in chemically amplified resists are represented by the general formula (I): ##STR1## wherein R.sub.1 is t-butyl or tetrahydropyranyl; R.sub.2 is hydrogen or methyl; n and m are integers; and the ratio n/((m+n) ranges from 0.1 to 0.9. Methods for manufacturing the resins comprise reacting a monomer represented by the formula (II): ##STR2## with a monomer represented by the formula (III): ##STR3## to form a copolymer represented by the formula (IV): ##STR4## wherein R.sub.1 and R.sub.2 are defined as above; and hydrolyzing acetoxy groups contained in the copolymer represented by the formula (IV) to form the resin compositions.

REFERENCES:
In-house Computer Generated Abstract pp. 18-20 Answer 8 of 9 document No. 120:90851 by Kobayashi et al; JP91-246541 910902.

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