Sputtering method and apparatus using a trigger gas feed

Details Sputtering method and apparatus using a trigger gas feed Sputtering method and apparatus using a trigger gas feed

1997-08-26

2000-06-27

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419212, 20429803, 20429807, 20429808, C23C 1434

Patent

active

060802863

ABSTRACT:
A trigger gas feed system is normally kept opened before a discharge is started. The trigger gas feed system is shut instantaneously, for example, when the discharge is generated, thereby to set a vacuum chamber at a sputtering pressure. The trigger gas feed system is opened again after the discharge is finished. The opened state is continued until another discharge is started. Accordingly, the pressure in the vacuum chamber before the discharge is maintained always constant, and the vacuum chamber is returned to the sputtering pressure in a short time.

REFERENCES:
patent: 4172020 (1979-10-01), Tisone et al.
patent: 4283260 (1981-08-01), Thomas et al.
patent: 4428812 (1984-01-01), Sproul
patent: 4440618 (1984-04-01), Suzuki et al.
patent: 5049251 (1991-09-01), Inoue
patent: 5082545 (1992-01-01), Tanaka et al.
patent: 5322605 (1994-06-01), Yamanishi

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