Process for producing a pattern with negative-type photosensitiv

Details Process for producing a pattern with negative-type photosensitiv Process for producing a pattern with negative-type photosensitiv

1987-04-13

1989-01-31

Shah, Mukund J.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

252156, 252528, 252529, 252541, 252547, 252548, 430301, 430326, G03C 500

Patent

active

048015199

ABSTRACT:
A developing solution comprising at least two compounds selected from choline and quaternary ammonium salts is suitable for developing a negative-type photosensitive resin composition with exposure to a smaller light amount.

REFERENCES:
patent: 4423138 (1983-12-01), Guild
patent: 4556629 (1985-12-01), Poulin et al.
patent: 4610953 (1986-09-01), Hashimoto et al.

Affiliated with

Also associated with

Rating

Process for producing a pattern with negative-type photosensitiv does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for producing a pattern with negative-type photosensitiv, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing a pattern with negative-type photosensitiv will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-177172