Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1995-08-17
1997-01-07
Monin, Jr., Donald L.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257369, 257409, 257535, H01L 2701, H01L 2906, H01L 21265
Patent
active
055920098
ABSTRACT:
In a dynamic random access memory device including an SOI substrate and a field shield isolation region, a p type impurity region is formed between an n type source/drain region of a transistor coupled to a storage node in a dynamic memory cell and an n type impurity region below a field shield electrode. A reverse bias voltage is supplied respectively between the p and n type impurity regions, and between the n type source/drain region of the transistor and the p type body region. As a result, leakage current from the n type source/drain region to the p type body region is compensated for by the leakage current from the n type impurity region to the p type impurity region.
REFERENCES:
patent: 5355012 (1994-10-01), Yamaguchi et al.
patent: 5440161 (1995-08-01), Iwamatsu et al.
Mitsubishi Denki & Kabushiki Kaisha
Monin, Jr. Donald L.
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