Photocurable resins for stereolithography and compositions conta

Details Photocurable resins for stereolithography and compositions conta Photocurable resins for stereolithography and compositions conta

1995-10-30

1997-01-07

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

522 96, 525404, 525450, C08F 2606

Patent

active

055915639

ABSTRACT:
Photocurable resins containing unsaturated urethane of a specified form and vinyl monomer which is N-(meth)acryloylmorpholine or its mixture with di-ol di(meth)acrylate at a rate within a specified range and compositions containing such a resin and a filler such as solid particles and/or inorganic whiskers of specified kinds at a specified rate are capable of yielding stereolithographed objects with improved mechanical and thermal properties and form precision.

REFERENCES:
patent: 4942001 (1990-07-01), Murphy et al.
patent: 5116186 (1992-11-01), Kojime et al.

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