Positive-working radiation-sensitive mixtures, and radiation-sen

Details Positive-working radiation-sensitive mixtures, and radiation-sen Positive-working radiation-sensitive mixtures, and radiation-sen

1992-04-20

1993-07-20

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430270, 430326, 522 50, G03F 7039, G03F 730

Patent

active

052292541

ABSTRACT:
A positive-working radiation-sensitive mixture containing

REFERENCES:
patent: 3697274 (1972-10-01), Herrmann
patent: 3779778 (1973-12-01), Smith et al.
patent: 4376818 (1983-03-01), Ohashi et al.
patent: 4425424 (1984-01-01), Altland et al.
patent: 4840867 (1989-06-01), Elsaesser et al.
Crivello, "Possibilities for Photoimaging Using Onium Salts", Polymer Engineering and Science Mid-Dec., 1983, vol. 23, pp. 953-956.
Houlihan, "An Evaluation of Nitrobenzyl Ester Chemistry for Chemical Amplification Resists", SPIE vol. 920 Advances in Resist Technology and Processing, 1988, pp. 67-73.
Willson, "Organic Resist Material--Theory and Chemistry", Introduction To Microlithography, 1983, pp. 89-159.
Ueno, "Chemical Amplification Positive Resist Systems Using Novel Sulfonates as Acid Generators", Polymers For Microelectronics, pp. 66-67.

Affiliated with

Also associated with

Rating

Positive-working radiation-sensitive mixtures, and radiation-sen does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive-working radiation-sensitive mixtures, and radiation-sen, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive-working radiation-sensitive mixtures, and radiation-sen will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1759654