Surface characterization apparatus and method

Radiant energy – Inspection of solids or liquids by charged particles – Analyte supports

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2504411, 2504421, 250400, 2504921, 250304, 250305, H01J 37305, G01F 137

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050536257

ABSTRACT:
An apparatus for conducting surface characterizations of sample materials comprises an enclosure defining first and second substantially isolated operating chambers or regions. The operating regions are separated by narrow channels, and are preferably differentially pumped. An elongate substrate extends between the first and second regions. During operation, a sample surface to be studied is prepared on the substrate in the first region, is transported into the second region, and is analyzed thereat. In a preferred embodiment a continuous loop and pulley arrangement is provided, for the substrate. Also, for a preferred embodiment the first region is divided into first and second isolated chambers, through which the substrate is extended. A method is provided, whereby a surface can be prepared and analyzed. According to the method, the sample is applied to a substrate in a first region, and the substrate is transported into a second isolated region, through an elongate narrow channel. Differential pumping facilitates isolation of environments in the various regions.

REFERENCES:
patent: 2640788 (1953-06-01), Rockett, Jr.
patent: 3104321 (1963-09-01), Smith, Jr.
patent: 3294670 (1966-12-27), Charschan et al.
patent: 3805736 (1974-04-23), Foehring et al.
patent: 4015558 (1977-04-05), Small et al.
patent: 4348886 (1982-09-14), Faith, Jr.
patent: 4400409 (1983-08-23), Izu et al.
patent: 4410558 (1983-10-18), Izu et al.
patent: 4438723 (1984-03-01), Cannellar et al.
patent: 4442788 (1984-04-17), Weis
patent: 4642467 (1987-02-01), Yamawaki et al.
patent: 4732776 (1988-03-22), Boissevain
patent: 4810342 (1989-03-07), Inoue
patent: 4841908 (1989-06-01), Jacobson et al.
patent: 4874631 (1989-10-17), Jacobson et al.
patent: 4985635 (1991-01-01), Inokuti et al.
A: Hercules, Analytical Chemistry, 58(12), 1177-1190 (Oct. 1986).
B: Zalar, Thin Solid Films, 124, 223-230 (1985).
C: Zalar, Surface and Interface Analysis, 9, 41-46 (1986).
D: Bodo et al., J. Vac. Sci. Technol. A., 2(4), 1498-1502 (Oct.-Dec. 1984).
E: Bodo et al., Surface and Interface Analysis, 9, 437-440 (1986).
F: Ho et al., J. Vac. Sci. Technol. A., 3(3), 739-745 (May/Jun. 1985).
G: Chou et al., J. Vac. Sci. Technol. A., 2(2), 751-755 (Apr.-Jun. 1984).
H: Stroh et al., LC-GC, 5(7), 562-570 (Jul. 1987).

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