Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1982-01-18
1984-03-27
Louie, Jr., Won H.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430270, 430495, 430496, 430935, G03C 168
Patent
active
044395140
ABSTRACT:
Photographic and Photolithographic systems are provided which utilize diacetylenic materials as components thereof. Such materials, which include at least two acetylenic bonds in conjugation with one another, provide a combination of both high sensitivity and high resolving power, thus resulting in superior photographic and photolithographic properties.
In accordance with a preferred embodiment of the invention, a substrate is coated with at least one layer of a polymerizable composition comprising a diacetylenic species, said layer being organized into a plurality of domains having a substantially regular array of the diacetylenic species. In other embodiments, covalent bonding of the diacetylenic layer to the substrate is accomplished through the use of suitably constituted silane species, thus to provide a highly beneficial adhesion of substrate and photo- or photolithographic layer.
REFERENCES:
patent: 3811895 (1974-05-01), Ehrlich
patent: 3822134 (1974-07-01), Rasch et al.
patent: 3911169 (1975-10-01), Lesaicherre
patent: 4168982 (1979-09-01), Pazos
Tieke, et al: The Quantum Yield of the Topochemical Photopolymerization of Diacetylenes in Multilayers, Makromol. Chem. 179, 1639-1642 (1978).
Lieser, et al.: Polymerization of Diacetylenes in Multilayers, Journal of Polymer Science, vol. 17, 1631-1644 (1979).
Kalyanaraman, et al.: Synthesis of Nitrophenoxymethyl Substituted Diacetylene Monomers, Makromol. Chem. vol. 180, May (1979) 1393-1398.
Plueddemann: "Mechanism of Adhesion Through Silane Coupling Agents" in Composite Materials, Brautman, Krock eds. vol. 6, Ch. 6, Academy Press (1974).
Louie, Jr. Won H.
University Patents Inc.
LandOfFree
Photoresistive compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photoresistive compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoresistive compositions will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1756300