Positively photosensitive polyimide composition

Details Positively photosensitive polyimide composition Positively photosensitive polyimide composition

1990-01-09

1991-10-01

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430176, 528184, 528185, 528188, 528353, 528 26, G03C 7039

Patent

active

050533142

ABSTRACT:
A positively photosensitive polyimide composition is disclosed, which composition comprises polyimide having repeating unit represented by formula (I): ##STR1## wherein Ar.sup.1 represents a tetravalent aromatic hydrocarbon group; Ar.sup.2 represents a divalent aromatic hydrocarbon group having an acyloxy group at the ortho-position and/or the meta-position of the aromatic ring; Ar.sup.3 represents a divalent aromatic hydrocarbon group; and the subunit having an amount ratio of m in the repeating unit is present in an amount of at least 20% by weight based on the polyimide. The composition exhibits high photosensitivity in reproduction of a fine pattern and excellent dimensional stability.

REFERENCES:
patent: 3336258 (1967-08-01), Angelo et al.
patent: 3961099 (1976-06-01), Gipstein et al.
patent: 4657832 (1987-04-01), Pfeifer
patent: 4713439 (1987-12-01), St. Clair et al.
Polymer, vol. 24, pp. 995-1000 (Aug. 1983), "PolyCp-tert-butoxycarbonyloxystyrene): a Conventient Precursor to P-Hydroxystyrene Resins".

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