Method of forming patterned film on substrate surface by using m

Details Method of forming patterned film on substrate surface by using m Method of forming patterned film on substrate surface by using m

1988-12-08

1989-10-17

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156651, 156655, 156657, 1566591, 156667, B44C 122, C03C 1500, C03C 2506, C23F 102

Patent

active

048744620

ABSTRACT:
The invention relates to a sol-gel method for forming a patterned film of a metal compound, e.g. TiO.sub.2, SiO.sub.2, ZrO.sub.2, Al.sub.2 O.sub.3, TiN or Si.sub.3 N.sub.4, on a substrate by applying a metal alkoxide sol to the substrate, allowing the sol film on the substrate to turn into a gel film by hydrolysis, removing the gel film in the unnecessary area(s) by selective etching and baking the gel film in the remaining aarea(s). The selective etching of the gel film is easily accomplished by the steps of moistening the gel film in the unnecessary area(s) with a viscous liquid containing, e.g., an organic solvent or an organic acid, hardening the gel film in the remaining area(s) by mild heating, and then removing the gel film in the unnecessary area(s) by washing with a suitable liquid such as an alkali solution or, when said viscous solution contains an organic acid and water, water.

REFERENCES:
patent: 3483027 (1969-12-01), Ritzerfeld et al.
patent: 4348255 (1982-09-01), Schmidt

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