Apparatus for heat-treating wafers

Details Apparatus for heat-treating wafers Apparatus for heat-treating wafers

1988-02-11

1989-07-18

Walberg, Teresa J.

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

219536, H05B 364

Patent

active

048496081

ABSTRACT:
An apparatus for heat-treating wafers including: a cylindrical body having an infrared reflection film formed on an interior peripheral surface thereof; a furnace core tube disposed within the cylindrical body for accommodating therein the wafers; a heater element provided within the cylindrical body for heating the furnace core tube, the heater being positioned outwardly remotely from an exterior peripheral surface of the furnace core tube in a manner to surround the tube; and a plurality of insulating heat-resistant bar members provided within the cylindrical body and extending in a direction parallel to the central axis of the furnace core tube for supporting the heater element.

REFERENCES:
patent: 1234499 (1917-07-01), Smalley
patent: 2006685 (1935-07-01), Moore
patent: 3370120 (1968-02-01), Lasch
patent: 3804967 (1974-04-01), Werych
patent: 4048473 (1977-09-01), Burkhart
patent: 4347431 (1982-08-01), Pearce

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