Method of cleaning apparatus for forming deposited film

Details Method of cleaning apparatus for forming deposited film Method of cleaning apparatus for forming deposited film

1984-01-30

1985-07-16

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

118 501, 118670, 118715, 156345, 156646, 204192E, 204298, 134 1, 427 38, B44C 122, C03C 1500, C03C 2506

Patent

active

045294747

ABSTRACT:
A method of cleaning an apparatus for forming deposited film on a substrate to remove the substances attached to the inside walls of a reaction chamber in the course of the formation of deposited film on the substrate by etching with plasma reaction comprises using a gas mixture of carbon tetrafluoride and oxygen as etchant.

REFERENCES:
patent: 4138306 (1979-02-01), Niwa

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