Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Patent
1998-01-13
2000-11-28
Bowers, Charles
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
438622, 438633, 438687, 438659, 438629, 438672, H01L 214763
Patent
active
061535079
ABSTRACT:
There is provided a method of fabricating a semiconductor device, including the steps of forming a first insulating film on a semiconductor substrate, forming a metal wiring layer on the first insulating film, forming a second insulating film over both the first insulating film and the metal wiring layer at a temperature lower than a temperature at which the metal wiring layer is oxidized, implanting impurities into the second insulating film, the impurities having an ability of preventing diffusion of metal of which the metal wiring layer is made, and forming a third insulating film on the second insulating film. The method prevents an increase in electrical resistance of the metal wiring layer, and at the same time, improves oxidation resistance of the metal wiring layer and prevents diffusion of metal into an insulating film surrounding the metal wiring layer. As a result, the method provides long-term reliability and an enhanced fabrication yield to a semiconductor device.
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Bowers Charles
NEC Corporation
Nguyen Thanh
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