Method for selectively etching integral cathode substrate and su

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156345, 156656, 1566591, C23F 102, B44C 122, C03C 1500, C03C 2506

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active

048490660

ABSTRACT:
A method for preparing an integral cathode substrate and support includes the steps of placing formed metal parts on a pin holder, masking selected surface portions of the formed metal parts, etching the unmasked surface portions, and then removing the mask. The present method is an improvement over prior methods since the parts are arranged in a staggered array to increase the turbulence of the etchant during the etching step. The turbulence provides additional oxygen to increase the rate and uniformity of the etching.

REFERENCES:
patent: 3432900 (1969-03-01), Kerstetter
patent: 4376009 (1983-03-01), Kunz
patent: 4441957 (1984-04-01), Poff
TN No. 1159 dated Jul. 23, 1976 by John Coryell Turnbull entitled, "One-Piece Bimetal Cathode Cup and Sleeve".

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