Method for the preparation of relief structures by phototechniqu

Details Method for the preparation of relief structures by phototechniqu Method for the preparation of relief structures by phototechniqu

1980-05-09

1981-09-01

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

430281, 430287, 430322, 430919, G03C 500

Patent

active

042872944

ABSTRACT:
The invention relates to a method for making more efficient the preparation of relief structures by phototechniques from mixtures containing olefinically unsaturated polymers and azides as photo initiators. For this purpose, the invention provides the use of aromatic azidomaleinimides as photo initiators. The method according to the invention is suitable particularly for the structuring by phototechniques of insulating materials as well as of semiconductor and conductor materials.

REFERENCES:
patent: Re30186 (1980-01-01), Rubner et al.
patent: 3475176 (1969-10-01), Rauner
patent: 3957512 (1976-05-01), Kleeberg et al.
patent: 3979426 (1976-09-01), Demajistre

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